杨雷/刁东风等在APL发表石墨烯纳晶诱导强烈光电响应阅读次数 [3585] 发布时间 :2016-07-28 11:38:56
APPLIED PHYSICS LETTERS 109, 031910 (2016)
Nanosized graphene sheets enhanced photoelectric behavior of carbon film
on p-silicon substrate
Lei Yang,1,a) Gaijuan Hu,1,a) Dongqing Zhang,1 and Dongfeng Diao 2,b)
1 Key Laboratory of Education Ministry for Modern Design and Rotor-Bearing System,
School of Mechanical Engineering, Xi’an Jiaotong University, Xi’an 710049, China
2 Institute of Nanosurface Science and Engineering (INSE), Shenzhen University, Shenzhen 518060, China
(Received 4 May 2016; accepted 12 July 2016; published online 21 July 2016)
We found that nanosized graphene sheets enhanced the photoelectric behavior of graphene sheets
embedded carbon (GSEC) film on p-silicon substrate, which was deposited under low energy electron
irradiation in electron cyclotron resonance plasma. The GSEC/p-Si photodiode exhibited good
photoelectric performance with photoresponsivity of 206 mA/W, rise and fall time of 2.2, and
4.3 ls for near-infrared (850 nm) light. The origin of the strong photoelectric behavior of GSEC
film was ascribed to the appearance of graphene nanosheets, which led to higher barrier height and
photoexcited electron-collection efficiency. This finding indicates that GSEC film has the potential
for photoelectric applications. Published by AIP Publishing. [http://dx.doi.org/10.1063/1.4959563]