Low-energy electron irradiation induced top-surface nanocrystallization of amorphous carbon filmViews  Delivery time :2016-06-06 11:08:43
我所论文：Low-energy electron irradiation induced top-surface nanocrystallization of amorphous carbon film，发表于国际期刊Applied Surface Science。
Low-energy electron irradiation induced top-surfacenanocrystallization of amorphous carbon film
Applied Surface Science 384 (2016) 341–347
Cheng Chen, Xue Fan*, Dongfeng Diao*
We report a low-energy electron irradiation method to nanocrystallize the top-surface of amorphouscarbon film in electron cyclotron resonance plasma system. The nanostructure evolution of the carbonfilm as a function of electron irradiation density and time was examined by transmission electron micro-scope (TEM) and Raman spectroscopy. The results showed that the electron irradiation gave rise to theformation of sp2nanocrystallites in the film top-surface within 4 nm thickness. The formation of sp2nanocrystallite was ascribed to the inelastic electron scattering in the top-surface of carbon film. Thefrictional property of low-energy electron irradiated film was measured by a pin-on-disk tribometer.The sp2nanocrystallized top-surface induced a lower friction coefficient than that of the original pureamorphous film. This method enables a convenient nanocrystallization of amorphous surface.